Tokyo, Japan - July 16, 2008 - TOOL Corporation (headquarters in Tokyo, Japan, president Hideaki Hontao) today announced that the latest version of MaskStudio, the company's fracturing system that converts layout design data to mask writer format data has been deployed as one of key tools in the Electronic Device Operations of DNP, Dai Nippon Printing Co., Ltd. (headquarters in Tokyo, Japan, president Yoshitoshi Kitajima).
To support shrinking process node and larger data size, a high-precision and high-performance fracturing system is required. MaskStudio offers various super high precision features, including the sliver control, that are beneficial in all design cases including the most advanced design data and products in mass production. The latest version has been enhanced with even faster process speed and significant reduction of memory consumption. MaskStudio is a "high-precision" and "high-performance" fracturing system capable to support shrinking process node and larger data size.
"Increasing the speed of fracturing for large sized data has been a critical need, where MaskStudio met our expectation for the spec, and it also offers various high-precision features such as sliver control," said Kazunori Shibayama, General Manager of ISMS Promotion Department in Electronic Device Operations of DNP. "The TAT reduction is greater than before, especially with parallel processing, which gives commensurate increase as setting more parallel processors. We plan to use it for many products."
"It is a great honor that we will contribute to make DNP's fracturing more efficient through their adoption of latest version MaskStudio," said Hideaki Hontao, president of TOOL. "We would like to respond to the needs of customers facing increasing large chip data, and enhance MaskStudio in both its features and performance."
MaskStudio is a fracturing system that allows layout design data to be converted into various mask writer formats with power to handle huge data. It achieves high throughput by its Boolean operation function, parallel distributed processing technology and job management feature, which becomes a robust solution for large and complex OPCed data conversion. Moreover, incorporating sliver control function, MaskStudio generates pattern data optimized for each mask-writing machine and thus reduces the running cost and TAT.
TOOL is a Japanese software development company focused primarily on EDA tool development. Its particular strength is in the area of layout design, and has scored a number of achievements in this area with its development tool, LAVIS and MaskStudio. Solutions to chipmakers' problems can be provided by combining TOOL's package-software with its custom-tailored software developed to serve a customer's particular need. TOOL provides ample experience in this particular area.
For more information on TOOL and products, please refer to http://www.tool-corp.com/.
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